Thermal measuring and testing – Temperature measurement – Nonelectrical – nonmagnetic – or nonmechanical temperature...
Patent
1993-09-16
1995-02-14
Gutierrez, Diego F. F.
Thermal measuring and testing
Temperature measurement
Nonelectrical, nonmagnetic, or nonmechanical temperature...
374120, 356 44, G01K 1100, G01J 548
Patent
active
053889096
ABSTRACT:
An optical method and apparatus for measuring the temperature of a substrate material with a temperature dependent bandgap. The substrate is illuminated with a broad spectrum lamp and the bandgap is determined from the spectrum of the diffusely scattered light. The spectrum of the light from the lamp is sufficiently broad that it covers the spectral range above and below the bandgap of the substrate. Wavelengths corresponding to photon energies less than the bandgap of the substrate are transmitted through the substrate and are reflected from the back surface of the substrate as well as from the front surface while the wavelengths corresponding to photon energies larger than the bandgap are reflected only from the front surface. If the front surface is polished the front surface reflection will be specular while if the back surface is rough the reflection from the back surface will be non-specular. The back surface reflection is detected with a detector in a non-specular location. From the wavelength of the onset of the non-specular reflection the bandgap can be determined which gives the temperature. The temperature is determined from the knee in the diffuse reflectance spectrum near the bandgap.
REFERENCES:
patent: 4437761 (1984-03-01), Kroger et al.
patent: 4703175 (1987-10-01), Salour et al.
patent: 4841150 (1989-06-01), Walter
patent: 4979133 (1990-12-01), Arima et al.
patent: 5098199 (1992-03-01), Amith
patent: 5118200 (1992-06-01), Kirillov et al.
patent: 5213985 (1993-05-01), Sandroff et al.
Hellman et al., "IR Transmission Spectroscopy of GaAs During Molecular Beam Epitaxy", J. Cryst. Growth 81, 38 (1987).
Weilmeier et al., "A New Optical Temperature Measurement Technique for Semiconductor Substrates in Molecular Beam Epitaxy", Can. J. Phys. 69, 422 (1991).
C. Lavoie et al., "Diffuse Optical Reflectivity Measurements on GaAs During Molecular Beam Epitaxy Processing", J. Vac. Sci. Technol. A 10, 930 (1992).
S. R. Johnson et al., "Semiconductor Substrate Temperature Measurement by Diffuse Optical Reflectance Spectroscopy in Molecular Beam Epitaxy", J. Vac. Sci. Technol. B 11, 1007 (1993).
Brochures of CI Systems Inc., 5137 Clareton Drive, Suite 220, Agoura Hills Calif. 91301 (Nov. 1993).
Johnson Shane R.
Lavoie Christian
Nissen Mark K.
Tiedje J. Thomas
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