Mask for laser crystallization and crystallization method...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S022000

Reexamination Certificate

active

07368204

ABSTRACT:
A mask for laser crystallization includes a transmissive portion defining a crystallization pattern and an alignment pattern. The alignment pattern includes a first pattern group having a size corresponding to the crystallization pattern and a second pattern group having a plurality of radial bars surrounding the first pattern group. A shielding portion surrounds the transmissive portion.

REFERENCES:
patent: 7033434 (2006-04-01), Kim
patent: 96-16314 (1996-12-01), None
patent: 2002-0064138 (2002-08-01), None
patent: 2003-0034730 (2003-05-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Mask for laser crystallization and crystallization method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask for laser crystallization and crystallization method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask for laser crystallization and crystallization method... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2813640

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.