Electro-optical device, method of manufacturing the same,...

Details Electro-optical device, method of manufacturing the same,... Electro-optical device, method of manufacturing the same,...

2008-03-11

2008-03-11

Duong, Thoi V. (Department: 2871)

Liquid crystal cells, elements and systems

Nominal manufacturing methods or post manufacturing...

C349S138000, C438S692000, C216S038000

Reexamination Certificate

active

07342638

ABSTRACT:
According to an aspect of the invention, to completely planarize the outermost surface of a laminated structure by appropriately performing a planarizing process, such as a CMP process, in an electro-optical device, such as a liquid crystal device, an electro-optical device includes TFTs that constitute driving circuits to drive data lines and scanning lines that are arranged in a peripheral region around an image display region, and an interlayer insulating film formed on the data lines, scanning lines, TFTs, and the driving circuits. In the interlayer insulating film formed in the peripheral region, after an etching process is performed on at least portions corresponding to regions in which the driving circuits are formed, a CMP process is performed on the peripheral region and the image display region.

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