Measuring method and system

Optics: measuring and testing – Of light reflection

Reexamination Certificate

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Reexamination Certificate

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07317534

ABSTRACT:
A measuring signal in the detecting area is calibrated on the basis of a measuring signal in the reference area by the reference method. The rate of change with time of the difference between the measuring signal and an estimated result of the measurement (ORU constant) is calculated in the period where it is expected that the signal shows a fixed value and the components which change at a rate of change calculated for the entire period of the measuring period with the instance when a buffer containing thereon an analyte is supplied taken as a reference are taken as the drift components and correction to remove the drift components from the measuring signal is carried out.

REFERENCES:
patent: 4844613 (1989-07-01), Batchelder et al.
patent: 5434663 (1995-07-01), Maule
patent: 5485277 (1996-01-01), Foster
patent: 5492840 (1996-02-01), Malmqvist et al.
patent: 6417924 (2002-07-01), Kimura
patent: 6956651 (2005-10-01), Lackritz et al.
patent: 7030988 (2006-04-01), Kubo et al.
patent: 2005/0175999 (2005-08-01), Klakamp et al.
patent: 2005/0216205 (2005-09-01), Tsuzuki
patent: 2006/0044563 (2006-03-01), Fujikura
patent: 2006/0073609 (2006-04-01), Shimizu et al.
patent: 6-167443 (1994-06-01), None
patent: WO 03/056296 (2003-07-01), None
patent: WO 03/056296 (2003-07-01), None
Takayuki Okamoto, “Surface Refracto-Sensor using Evanescent Waves: Principles and Instrumentations”, vol. 47, No. 1, 1998, pp. 19-28.
Danny van Noort, et al., “Porous Gold in Surface Plasmon Resonance Measurement”, EUROSENSORS X III, 1999, pp. 585-588.

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