Optical metrology optimization for repetitive structures

Details Optical metrology optimization for repetitive structures Optical metrology optimization for repetitive structures

2008-06-17

2008-06-17

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Shape or surface configuration

C356S604000, C702S167000

Reexamination Certificate

active

07388677

ABSTRACT:
The top-view profiles of repeating structures in a wafer are characterized and parameters to represent variations in the top-view profile of the repeating structures are selected. An optical metrology model is developed that includes the selected top-view profile parameters of the repeating structures. The optimized optical metrology model is used to generate simulated diffraction signals that are compared to measured diffraction signals.

REFERENCES:
patent: 5442676 (1995-08-01), Fewster
patent: 5530732 (1996-06-01), Takemi
patent: 5748509 (1998-05-01), Fewster
patent: 5773174 (1998-06-01), Koizumi et al.
patent: 5965309 (1999-10-01), Ausschnitt et al.
patent: 6256100 (2001-07-01), Banet et al.
patent: 6429930 (2002-08-01), Littau et al.
patent: 6522413 (2003-02-01), Opsal et al.
patent: 6639674 (2003-10-01), Sokolov et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6823043 (2004-11-01), Fewster et al.
patent: 6891626 (2005-05-01), Niu et al.
patent: 6917433 (2005-07-01), Levy et al.
patent: 6943900 (2005-09-01), Niu et al.
patent: 7046375 (2006-05-01), Bischoff et al.
patent: 7065423 (2006-06-01), Prager et al.
patent: 7126700 (2006-10-01), Bao et al.
patent: 2003/0048458 (2003-03-01), Mieher et al.
patent: 2003/0212525 (2003-11-01), Bischoff et al.
patent: 2003/0225535 (2003-12-01), Doddi et al.
patent: 2004/0017574 (2004-01-01), Vuong et al.
patent: 2004/0017575 (2004-01-01), Balasubramanian et al.
patent: 2004/0078173 (2004-04-01), Bischoff et al.
patent: 2004/0267397 (2004-12-01), Doddi et al.
Chemali, C. E. et al. (Aug. 2004). “Run-to-Run Critical Dimension and Sidewall Angle Lithography Control Using the PROLITH Simulator,”IEEE Transactions on Semiconductor Manufacturing17(3):388-401.
Li, L. (1996). “Formulation and Comparison of Two Recursive Matrix Algorithms For Modeling Layered Diffraction Gratings,”J. Opt. Soc. Am. A13:1024-1035.
Haykin, S. (1999).Neural Networks. Prentice Hall.

Affiliated with

Also associated with

Rating

Optical metrology optimization for repetitive structures does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Optical metrology optimization for repetitive structures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Optical metrology optimization for repetitive structures will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2810706