Method for manufacturing mask, method for manufacturing...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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Details

C430S311000, C430S319000, C430S321000, C430S330000, C427S164000, C347S106000, C347S107000

Reexamination Certificate

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07399560

ABSTRACT:
A method for manufacturing a mask includes performing a lyophobic treatment on at least one surface of a translucent substrate; disposing a light-shielding material on the surface subjected to the lyophobic treatment of the translucent substrate in a desired shape by using a droplet discharge method; and firing the light-shielding material so as to form a light-shielding pattern on the translucent substrate.

REFERENCES:
patent: 5637426 (1997-06-01), Uchikawa
patent: 2003/0024103 (2003-02-01), Kiguchi et al.
patent: 2004/0191641 (2004-09-01), Ray et al.
patent: 2004/0247797 (2004-12-01), Hirai
patent: 11-343442 (1999-12-01), None
patent: 2003-315813 (2003-11-01), None
patent: 2004-071473 (2004-03-01), None

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