Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Reexamination Certificate
2008-06-10
2008-06-10
Vinh, Lan (Department: 1792)
Semiconductor device manufacturing: process
Chemical etching
Combined with the removal of material by nonchemical means
C438S691000, C438S745000, C216S097000, C134S001200
Reexamination Certificate
active
07384870
ABSTRACT:
A method for providing a high quality glass substrate that if free of residual polishing particles. The method includes polishing the surface of the glass plate with a polishing agent containing cerium oxide particles, washing the glass plate with washing agent containing the three components of acid, a reducing agent, and fluorine ion. The washing agent is provided with an etching effect by the acid, a reducing and decomposing effect by the reducing agent, and a dissolving enhancing effect by the cerium oxide by fluorine ion. The synergistic effect of the three components provides the washing agent with an extremely high ability for washing away cerium oxide and foreign matter from the surface of the glass plate through a small amount of etching such that potential scratches are not produced.
REFERENCES:
patent: 5680285 (1997-10-01), Nakamura et al.
patent: 5868953 (1999-02-01), Maekawa et al.
patent: 6248143 (2001-06-01), Masuda et al.
patent: 6299659 (2001-10-01), Kido et al.
patent: 6326305 (2001-12-01), Avanzino et al.
patent: 6350692 (2002-02-01), Economikos et al.
patent: 6395634 (2002-05-01), Miyamoto
patent: 6568995 (2003-05-01), Mitani et al.
patent: 6576353 (2003-06-01), Mitani et al.
patent: 6582279 (2003-06-01), Fox et al.
patent: 6584989 (2003-07-01), Taft et al.
patent: 6810887 (2004-11-01), Tan
patent: 2001/0041657 (2001-11-01), Abe et al.
patent: 2002/0157199 (2002-10-01), Piltingsrud
patent: 10-198942 (1998-07-01), None
patent: 2002-109727 (2002-04-01), None
patent: 2002-150547 (2002-05-01), None
Mitani Kazuishi
Saito Yasuhiro
Akerman & Senterfitt
Hoya Corporation
Vinh Lan
LandOfFree
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