Electron beam lithography process

Details Electron beam lithography process Electron beam lithography process

1976-12-27

1978-07-04

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

219121EM, A61K 2702

Patent

active

040990621

ABSTRACT:
In an electron beam lithography process, shapes are formed which differ from the beam spot size and the grid by employing multiple overlapping exposures having a reduced exposure level.

REFERENCES:
patent: 3644700 (1972-02-01), Kruppa et al.
patent: 3866013 (1975-02-01), Ryan

Affiliated with

Also associated with

Rating

Electron beam lithography process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam lithography process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam lithography process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-279587