Photomask producing method and photomask blank

Details Photomask producing method and photomask blank Photomask producing method and photomask blank

2008-01-01

2008-01-01

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07314690

ABSTRACT:
In a method of producing a photomask (10) in which a light-transmissive substrate (1) is formed thereon with a chromium pattern (21) having a global opening ratio difference in its plane on the light-transmissive substrate (1), use is made, as an etching mask for a chromium film (2), of an etching mask pattern (31) made of an inorganic-based material having a resistance against etching of the chromium film (2). Dry etching of the chromium film (2) is carried out under a condition selected from conditions that cause damage to a resist pattern (41) to a degree which is unallowable when etching the chromium film (2) using the resist pattern (41) as a mask.

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VLSI Synthetic Dictionary (Science Forum) (a part of p. 865).
Submicron Lithography “Synthetic Technological Material Collection” (a part of p. 353).

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