Thin film transistor array substrate and method of producing...

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S072000, C257SE29151, C438S149000, C438S508000, C438S508000

Reexamination Certificate

active

07323713

ABSTRACT:
A method of producing a thin film transistor array substrate which includes an insulating substrate, a display pixel having a pixel electrode connected to a drain electrode, a gate wiring, and a source wiring perpendicular to the gate wiring, comprising forming a first thin metal multi-layer film an upper layer of which includes aluminum, and spreading a photo-resist, forming the photo-resist to a thickness less in an area connected to a second thin metal film than other area, patterning the first thin metal film, reducing a thickness of the photo-resist layer and removing the photo-resist in the area, removing the upper layer in the area to expose a lower layer, forming an interlayer insulating film and patterning it to expose the lower layer in the area, and patterning the second thin metal film to include the area, to connect the lower layer to the second thin metal film.

REFERENCES:
patent: 6087678 (2000-07-01), Kim
patent: 2006/0197085 (2006-09-01), Kang

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Thin film transistor array substrate and method of producing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thin film transistor array substrate and method of producing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film transistor array substrate and method of producing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2791666

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.