Semiconductor device

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357 16, 357 68, 357 91, 357 65, H01L 2972

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049672541

ABSTRACT:
A semiconductor device includes a collector layer comprising a first conductivity type semiconductor layer, a base layer comprising a second conductivity type semiconductor layer produced on the collector layer, an emitter layer comprising a first conductivity type semiconductor layer produced on the base layer, a contact layer comprising an undoped semiconductor layer produced on the emitter layer, second conductivity type first implantation regions produced at regions each consisting of the contact layer, the emitter layer, and the base layer, so as to leave a central region therebetween, base electrodes produced on the first implantation regions, a first conductivity type second implantation region produced by implanting impurities from the surface of the contact layer extending into the emitter layer, in a region between the first implantation regions, and an emitter electrode produced on the second implantation region. Or, a semiconductor device includes an emitter layer comprising undoped semiconductor layer and a first conductivity type second implantation region produced by implanting impurities from the surface of the undoped semiconductor layer extending into the base layer, at a region between the first implantation regions.

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Morizuki et al; "Self Aligned AlGaAS/GaAs HBTs and 35 ps LCML Ring Oscillators Fabricated by Mg and P Double Imitation", C-5-4, Conference on Solid State Devices and Materials, Tokyo, 1986, pp. 359-362.

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