Liquid reaction mass for high-G simulation

Measuring and testing – Testing by impact or shock – Specimen directly subjected to a fluid pressure pulse or wave

Reexamination Certificate

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Reexamination Certificate

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07392688

ABSTRACT:
An apparatus for simulating a dynamic high-g environment that includes a test specimen, an incompressible liquid situated adjacent to the test specimen, and a device for creating a dynamic force on the test specimen. In one embodiment, the device for creating a dynamic force includes a vibration actuator that creates a force by creating movement between the test specimen and the incompressible liquid.

REFERENCES:
patent: 2698105 (1954-12-01), Mackas
patent: 3729980 (1973-05-01), Johnson et al.
patent: 4010631 (1977-03-01), Pollin
patent: 4557143 (1985-12-01), Pollin
patent: 4566314 (1986-01-01), Thurston
patent: 4610256 (1986-09-01), Wallace
patent: 4884456 (1989-12-01), Meline et al.
patent: 5138884 (1992-08-01), Bonavia
patent: 5355456 (1994-10-01), Osofsky
patent: 5471877 (1995-12-01), Brown
patent: 5487298 (1996-01-01), Davis et al.
patent: 5550792 (1996-08-01), Crandall et al.
patent: 5918265 (1999-06-01), Oertel et al.
patent: 5987741 (1999-11-01), Banakis et al.
patent: 6655190 (2003-12-01), Grossman et al.
patent: 2002/0152816 (2002-10-01), Kim
patent: 2003/0074949 (2003-04-01), Albertini et al.
patent: 2004/0004904 (2004-01-01), Betts
patent: 2005/0126287 (2005-06-01), Malametz

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