Power management system for a semiconductor processing facility

Boots – shoes – and leggings

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

364493, 307 19, 307 29, H02J 100, H02J 300, H02J 346, G01R 1930

Patent

active

058019618

ABSTRACT:
Semiconductor processing tools in a semiconductor processing facility are coupled to communicate with a power management system. The power management system monitors the power consumption status of each of the semiconductor processing tools. Using the power consumption status of each of the semiconductor processing tools, the power management system stages the operation of the semiconductor processing tools so as to maintain the power consumption of the semiconductor processing facility below a predefined maximum power consumption. Limiting the power consumption to less than the predefined maximum power consumption reduces the per die processing costs without incurring the expense of building a new semiconductor processing facility or without modifying the semiconductor processing tools for larger batch sizes or for greater throughput.

REFERENCES:
patent: 4218737 (1980-08-01), Buscher et al.
patent: 4419665 (1983-12-01), Gurr et al.
patent: 4663539 (1987-05-01), Sharp et al.
patent: 5399531 (1995-03-01), Wu
patent: 5414640 (1995-05-01), Seem
patent: 5444637 (1995-08-01), Smesny et al.
patent: 5530932 (1996-06-01), Carmean et al.
patent: 5583419 (1996-12-01), Haller

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Power management system for a semiconductor processing facility does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Power management system for a semiconductor processing facility, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Power management system for a semiconductor processing facility will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-276745

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.