Process for designing and checking a mask layout

Details Process for designing and checking a mask layout Process for designing and checking a mask layout

1996-04-24

1998-09-01

Voeltz, Emanuel Todd

Boots, shoes, and leggings

382144, 430 5, G06F 1750

Patent

active

058019545

ABSTRACT:
A process for designing and checking a mask layout is provided. A mask layout is generated from a binary mask layout design. An aerial image of the mask layout is then calculated using simulation software. The simulated aerial image is then compared to the binary mask layout design and modifications are made to the mask layout if necessary.

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"Wavefront Engineering for Photolithography" by Marc D. Levenson , Physics Today, Jul. 1993. no page numbers.
"Lithography's Leading Edge, Part 1: Phase-shift Technology" by Pieter Burggraaf, Senior Editor, Semiconductor International, Feb. 1992., no page numbers.

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