Optical: systems and elements – Deflection using a moving element – Using a periodically moving element
Patent
1997-03-26
1998-09-01
Phan, James
Optical: systems and elements
Deflection using a moving element
Using a periodically moving element
359208, 359218, 359219, 355 67, G02B 2608
Patent
active
058018700
ABSTRACT:
A light exposure illuminating apparatus is provided which, employing harmonics of a continuously outputted laser beam, is small-sized, inexpensive and free from speckles and which achieves a high light source utilization efficiency. Specifically, a harmonics generating 1 generates fourth harmonics which are reflected and swept via a scanning lens 2 by a polygonal mirror 3. A cylindrical reflecting mirror radiates the fourth harmonics reflected by the polygonal mirror 3 on an arcuate aperture formed in a light exposure mask by a sweeping movement. The light of fourth harmonics transmitted through the arcuate aperture reaches a reticle 7 set on a semiconductor pattern. The illuminating light passed through the reticle 7 is projected on a wafer 9 via a concave mirror 5 and a convex mirror 76. The area of light exposure may be increased since the reticle 7 and the wafer 9 are moved in synchronism with the scanning of the scanning optical system.
REFERENCES:
patent: 3520586 (1970-07-01), Bousky
patent: 5416630 (1995-05-01), Ito et al.
patent: 5473409 (1995-12-01), Takeda et al.
patent: 5528027 (1996-06-01), Mizutani
patent: 5673134 (1997-09-01), Oka et al.
Oka Michio
Suganuma Hiroshi
Phan James
Sony Corporation
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