Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1996-08-23

1998-09-01

Mathews, A. A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 30, 355 55, G03B 2742

Patent

active

058018158

ABSTRACT:
A projection exposure apparatus includes a projection optical system for projecting a pattern of a reticle, illuminated with exposure light, onto a substrate to be exposed, an optical characteristic predicting device for predicting, in accordance with an equation including a predetermined correction coefficient, an amount of change in optical characteristic produced in the projection optical system as a result of projection of the pattern, an optical characteristic correcting device for correcting the optical characteristic in accordance with the prediction by the predicting device, an optical characteristic measuring device for measuring the amount of change in optical characteristic, a correction coefficient changing device for changing the correction coefficient in accordance with the measurement by the measuring device, a data storing device for storing the correction coefficient, changed by the changing device, as a data related to the reticle, and a control system operable, when a reticle to be used for the exposure is changed, to cause the predicting device to predict the amount of change in optical characteristic by using a correction coefficient in the data storing device corresponding to the reticle to be used.

REFERENCES:
patent: 4595282 (1986-06-01), Takahashi
patent: 4617469 (1986-10-01), Takahashi et al.
patent: 4659225 (1987-04-01), Takahashi
patent: 4825247 (1989-04-01), Kemi et al.
patent: 4874954 (1989-10-01), Takahashi et al.
patent: 5365342 (1994-11-01), Ayata et al.
patent: 5526093 (1996-06-01), Takahashi

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