Pattern generator

Optical: systems and elements – Optical modulator – Light wave directional modulation

Reexamination Certificate

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Details

C359S290000, C430S311000

Reexamination Certificate

active

07365901

ABSTRACT:
The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.

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H. Kuck et al., New System for fast submicron laser direct writing, SPIE vol. 2440, pp. 506-514.
P.M. Hagelin et al., Micromachining and microfabrication technology for adaptive optics, os Sep. 16, 1999.

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