Lithographic apparatus with enhanced spectral purity, device...

Details Lithographic apparatus with enhanced spectral purity, device... Lithographic apparatus with enhanced spectral purity, device...

2008-07-29

2008-07-29

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000

Reexamination Certificate

active

07405804

ABSTRACT:
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the radiation beam is reflected from at least one grazing incidence mirror that enhances the spectral purity of the radiation beam.

REFERENCES:
patent: 6469827 (2002-10-01), Sweatt et al.
patent: 6498351 (2002-12-01), Kruizinga et al.
patent: 2004/0227103 (2004-11-01), Singer et al.
patent: 2006/0001854 (2006-01-01), Singer et al.
patent: WO 2004/021085 (2004-03-01), None

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