Top coat composition

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – At least one aryl ring which is part of a fused or bridged...

Reexamination Certificate

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Details

C524S556000, C524S565000, C526S242000, C526S245000, C526S319000, C526S346000, C568S812000

Reexamination Certificate

active

07402626

ABSTRACT:
The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.

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patent: WO-2005/098541 (2005-10-01), None
Mitsuru Sato, “TOK Resist & Metal Development Status for Immersion Lithography”, Sematech Litho Forum Jan. 27 to 29, 2004 (Apr. 12, 2005).
Japanese Search Report dated Apr. 26, 2005 including English Translation of Relevant Portion (Twelve (12) pages).
Mitsuru Sato, “TOK Resist & Material Development Status for Immersion Lithography”, Sematech Litho Forum 28-29, Jan. 2004, Los Angeles, CA (retrieved on Mar. 29, 2004), Internet: http://www.sematech.org/resources/litho/meetings/forum/20040128/presentations/06—193—Sato—TOK.pdf.

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