Nitride semiconductor light-emitting device and method for...

Coherent light generators – Particular active media – Semiconductor

Reexamination Certificate

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C372S045010, C372S050100, C257S012000, C257S013000, C257S014000, C257S015000, C257S079000, C257S094000, C257S095000, C257S099000, C257S103000, C257S183000, C257S190000, C257S200000, C257S201000, C257S618000, C257SE21108, C257SE33001, C257SE33002, C257SE33005, C257SE33013, C257SE33033, C257SE33043, C438S042000, C438S043000, C438S044000, C438S046000, C438S047000, C313S506000

Reexamination Certificate

active

07903708

ABSTRACT:
A nitride semiconductor laser device uses a substrate with low defect density, contains reduced strains inside a nitride semiconductor film, and thus offers a satisfactorily long useful life. On a GaN substrate (10) with a defect density as low as 106cm−2or less, a stripe-shaped depressed portion (16) is formed by etching. On this substrate (10), a nitride semiconductor film (11) is grown, and a laser stripe (12) is formed off the area right above the depressed portion (16). With this structure, the laser stripe (12) is free from strains, and the semiconductor laser device offers a long useful life. Moreover, the nitride semiconductor film (11) develops reduced cracks, resulting in a greatly increased yield rate.

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Merriam-Webster OnLine definition of “above.”
Applied Physics Letters, vol. 73, No. 6 (Aug. 10, 1998), pp. 832-834.

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