Silicon phosphor electroluminescence device with nanotip...

Semiconductor device manufacturing: process – Electron emitter manufacture

Reexamination Certificate

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C438S634000, C438S636000, C257SE21453

Reexamination Certificate

active

07364924

ABSTRACT:
An electroluminescence (EL) device and a method are provided for fabricating said device with a nanotip electrode. The method comprises: forming a bottom electrode with nanotips; forming a Si phosphor layer adjacent the nanotips; and, forming a transparent top electrode. The Si phosphor layer is interposed between the bottom and top electrodes. The nanotips may have a tip base size of about 50 nanometers, or less, a tip height in the range of 5 to 50 nm, and a nanotip density of greater than 100 nanotips per square micrometer. Typically, the nanotips are formed from iridium oxide (IrOx) nanotips. A MOCVD process forms the Ir bottom electrode. The IrOx nanotips are grown from the Ir. In one aspect, the Si phosphor layer is a SRSO layer. In response to an SRSO annealing step, nanocrystalline SRSO is formed with nanocrystals having a size in the range of 1 to 10 nm.

REFERENCES:
patent: 6517740 (2003-02-01), Kataoka et al.
patent: 7202596 (2007-04-01), Tang et al.
J. Ruan et al APL vol. 83, #26, Dec. 26, 2003 p. 1-3.
A. Polman, J. Appl. Phys. 82 (1), Jul. 1, 1997 p. 1-39.
R. Chen et al, APL vol. 84, #9, 2004, p. 1552-1554.

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