Lithography arrangement and procedure that produces a...

Details Lithography arrangement and procedure that produces a... Lithography arrangement and procedure that produces a...

2008-04-08

2008-04-08

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S067000, C355S077000, C359S483010

Reexamination Certificate

active

07355679

ABSTRACT:
A lithography arrangement and lithographic method is described which permits exposure of a substrate with radiation simultaneously with good intensity and contrast. A means for generating electromagnetic radiation and for directing the electromagnetic radiation onto a mask is provided. The mask has structures that essentially run along a predeterminable course direction on the mask. The electromagnetic radiation is at least partially TM-polarized relative to the course direction, so that the TM-polarized electromagnetic radiation has a polarization direction at an angle of 90° with respect to the course direction. A receptacle device for receiving a substrate to be exposed is positioned so that the radiation impinges on the substrate. A means for rotating the polarization direction of the TM-polarized electromagnetic radiation transmitted through the mask is arranged between the mask and the receptacle device to form TE-polarized electromagnetic radiation.

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