Method and device for analyzing gas in process chamber

Details Method and device for analyzing gas in process chamber Method and device for analyzing gas in process chamber

1990-07-02

1992-03-03

Berman, Jack I.

Radiant energy

Ionic separation or analysis

With sample supply means

250289, 250282, H01J 4904

Patent

active

050935712

ABSTRACT:
A gas in a process chamber, such as a sputtering chamber, having a typical inside pressure of 10.sup.-1 to 10.sup.-3 Torr, is analyzed by a mass spectrometer, which should be used at a pressure range of lower than around 10.sup.-4 Torr. The method comprises evacuating a process chamber by a vacuum pump and supplying a gas to the process chamber, whereby a pressure in the process chamber is determined by the vacuum pump and the supplied gas, and that pressure in the process chamber is higher than a pressure in the vacuum pump, and analyzing the gas at a portion of or around the vacuum pump, which portion has a pressure lower than the pressure in the process chamber, by using a mass spectrometer.

REFERENCES:
Maliakai, Research/Development, May 1976, pp. 57-60.

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