Precursors for CVD silicon carbo-nitride films

Details Precursors for CVD silicon carbo-nitride films Precursors for CVD silicon carbo-nitride films

2011-04-26

2011-04-26

Gonzalez, Porfirio Nazario (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

C556S412000

Reexamination Certificate

active

07932413

ABSTRACT:
Classes of liquid aminosilanes have been found which allow for the production of silicon-containing films. These aminosilanes, in contrast, to some of the precursors employed heretofore, are liquid at room temperature and pressure allowing for convenient handling. In addition, the invention relates to a process for producing such films.The classes of compounds are generally represented by the formulas:and mixtures thereof, wherein R and R1in the formulas represent aliphatic groups typically having from 2 to about 10 carbon atoms, e.g., alkyl, cycloalkyl with R and R1in formula A also being combinable into a cyclic group, and R2representing a single bond, (CH2)n, a ring, or SiH2.

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