Lithographic apparatus and device manufacturing method...

Details Lithographic apparatus and device manufacturing method... Lithographic apparatus and device manufacturing method...

2011-01-04

2011-01-04

Mathews, Alan A (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S077000

Reexamination Certificate

active

07864295

ABSTRACT:
An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.

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