Thermal treatment apparatus, thermal treatment method and...

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed

Reexamination Certificate

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C438S005000, C438S006000, C438S008000, C438S009000, C438S010000, C438S011000, C438S012000, C438S013000, C438S016000, C438S800000, C257SE21530, C392S407000, C362S310000, C362S217060, C362S241000, C362S260000, C362S514000, C362S516000, C362S518000

Reexamination Certificate

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07927892

ABSTRACT:
A thermal treatment apparatus having a first light source emitting a first light having light diffusion property, a reflectance measuring unit irradiating a treatment target with the light from plural directions by the first light source and determining a light reflectance of the treatment target, a light irradiation controller adjusting an intensity of a second light of a second light source on the basis of the light reflectance, the second light has diffusion property, and a thermal treatment unit irradiating the treatment target with the second light having adjusted the intensity of the second light by the light irradiation controller.

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