Liquid recovery system, immersion exposure apparatus,...

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Reexamination Certificate

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C355S030000

Reexamination Certificate

active

08004651

ABSTRACT:
A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with a first opening; a gap portion that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part that suctions, through a porous member, at least part of the liquid that flows into the gap portion; and a second opening that is different from the first opening. The gap portion is open to the atmosphere through the second opening.

REFERENCES:
patent: 6208407 (2001-03-01), Loopstra
patent: 6262796 (2001-07-01), Loopstra et al.
patent: 6341007 (2002-01-01), Nishi et al.
patent: 6400441 (2002-06-01), Nishi et al.
patent: 6549269 (2003-04-01), Nishi et al.
patent: 6590634 (2003-07-01), Nishi et al.
patent: 6611316 (2003-08-01), Sewell
patent: 6778257 (2004-08-01), Bleeker et al.
patent: 6867844 (2005-03-01), Vogel et al.
patent: 6897963 (2005-05-01), Taniguchi et al.
patent: 7023610 (2006-04-01), Ohtsuki et al.
patent: 7292313 (2007-11-01), Poon et al.
patent: 2006/0087630 (2006-04-01), Kemper et al.
patent: 2006/0221315 (2006-10-01), Beckers et al.
patent: 2006/0231206 (2006-10-01), Nagasaka et al.
patent: 2007/0110213 (2007-05-01), Leenders et al.
patent: 2007/0222959 (2007-09-01), Nagasaka et al.
patent: 2008/0068567 (2008-03-01), Nagasaka et al.
patent: 1 703 548 (2006-09-01), None
patent: 1 768 170 (2007-03-01), None
patent: 1 863 070 (2007-12-01), None
patent: A-10-163099 (1998-06-01), None
patent: A-10-214783 (1998-08-01), None
patent: A-11-135400 (1999-05-01), None
patent: A-2000-505958 (2000-05-01), None
patent: A-2000-164504 (2000-06-01), None
patent: A-2004-519850 (2004-07-01), None
patent: WO 98/28665 (1998-07-01), None
patent: WO 99/46835 (1999-09-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 01/35168 (2001-05-01), None
patent: WO 02/069049 (2002-09-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/092833 (2004-10-01), None
patent: WO 2005/024517 (2005-03-01), None
patent: WO 2005/059617 (2005-06-01), None
patent: WO 2005/059618 (2005-06-01), None
patent: WO 2005/067013 (2005-07-01), None
patent: WO 2005/122221 (2005-12-01), None
patent: WO 2006/080516 (2006-08-01), None
Sep. 15, 2008 International Search Report for PCT/JP2008/051328.
Sep. 15, 2008 Written Opinion of the International Searching Authority for PCT/JP2008/051328.
Sep. 3, 2010 Chinese Office Action for Chinese Patent Application No. 200880002821.1 (with translation).

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