Source, an arrangement for installing a source, and a method...

Details Source, an arrangement for installing a source, and a method... Source, an arrangement for installing a source, and a method...

2011-04-12

2011-04-12

Chen, Keath T (Department: 1712)

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

Reexamination Certificate

active

07922821

ABSTRACT:
The invention relates to an arrangement for installing a source into a gas deposition reactor. The arrangement comprises at least one source fitting for the source such that the source fitting is connected to a reaction space of the gas deposition reactor, and a source installable at least partly inside the source fitting or a source space connected to the source fitting. According to the invention, the arrangement further comprises reception means in the source fitting for receiving the source, and charging means for installing the source in place in the source fitting for use, and a chamber (1), provided in the source, for a solid or liquid source material (3), and isolating means (7, 19) for isolating the chamber (1) substantially from environment.

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Serghini-Monim, S. et al., “New doser for chemical vapor deposition of low vapor-pressure solid precursors”,Rev. Sci, Instrum.,vol. 56, No. 10, pp. 3672-3674, Oct. 1996.
Apr. 27, 2010 Supplemental European Search Report for European Patent Application No. 06725934.1.

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