High efficiency lighting device and method for fabricating...

Active solid-state devices (e.g. – transistors – solid-state diode – Semiconductor is an oxide of a metal or copper sulfide

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE31126, C257SE33064, C438S046000, C438S609000, C977S811000

Reexamination Certificate

active

07863608

ABSTRACT:
The present invention discloses a high-efficiency lighting device and a method for fabricating the same. The method of the present invention comprises steps: providing an insulation substrate and sequentially forming an electrode layer and a seed layer on the insulation layer; forming a plurality of zinc oxide micro and nano structures and a plurality of first insulation units on the seed layer, wherein each zinc oxide micro and nano structure is arranged between two neighboring first insulation units; forming a nitride layer on the side wall of each zinc oxide micro and nano structure; and forming an electrode layer on each nitride layer. The present invention achieves a high-efficiency lighting device via growing nitride layers on the side walls of zinc oxide micro and nano structures. Further, the present invention can reduce the fabrication cost.

REFERENCES:
patent: 7265392 (2007-09-01), Hahn et al.
patent: 2006/0154389 (2006-07-01), Doan
patent: 2007/0041214 (2007-02-01), Ha et al.
patent: 2007/0158661 (2007-07-01), Lu et al.
patent: 2007/0235738 (2007-10-01), Jin et al.
patent: 2009/0032800 (2009-02-01), Lee et al.
patent: 2009/0146142 (2009-06-01), Kim et al.
patent: 2009/0267164 (2009-10-01), Wunnicke et al.
patent: 269779 (2007-01-01), None
H. Amano, N. Sawaki, and I. Akasaki; Metalorganic Vapor Phase Epitaxial Growth of a High Quality GaN Film Using an AIN Buffer Layer; Appl. Phys. Lett. 48 (5), Feb. 3, 1986, pp. 353-355.
S. Nakamura, T. Mukai, M. Senoh, N. Iwasa; Thermal Annealing Effects on P-Type Mg-Doped GaN Films; Jpn. J. Appl. Phys. vol. 31 (1992), pp. L139-L142, Part 2, No. 2B, Feb. 15, 1992.
S. Nakamura, M. Senoh, N. Iwasa, S. Nagahama, T. Yamada, T. Mukai; Superbright Green InGaN Single-Quantum-Well-Structure Light-Emitting Diodes; Jpn. J. Appl. Phys. vol. 34 (1995) pp. L 1332-L 1335, Part 2, No. 10B, Oct. 15, 1995.
Y. Narukawa, I. Niki, K. Izuno, M. Yamada, Y. Murazaki, T. Mukai; Phosphor-Conversion White Light Emitting Diode Using InGaN Near-Ultraviolet Chip; Jpn. J. Appl. Phys. vol. 41 (2002) pp. L 371-L 373, Part. 2, No. 4A, Apr. 1, 2002.
S. An, W. Park, G. Yi; Heteroepitaxal Fabrication and Structural Characterizations of Ultrafine GaN/ZnO Coaxial Nanorod Heterostructures; Applied Physics Letters, vol. 84, No. 18, May 3, 2004, pp. 3612-3614.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High efficiency lighting device and method for fabricating... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High efficiency lighting device and method for fabricating..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High efficiency lighting device and method for fabricating... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2724835

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.