Semiconductor substrate cleaning liquid and semiconductor...

Details Semiconductor substrate cleaning liquid and semiconductor... Semiconductor substrate cleaning liquid and semiconductor...

2011-03-01

2011-03-01

Webb, Gregory E (Department: 1761)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S003000, C510S175000

Reexamination Certificate

active

07896970

ABSTRACT:
A semiconductor substrate cleaning liquid composition is provided that includes one or more types selected from the group consisting of a compound having at least two sulfonic acid groups per molecule, phytic acid, and a condensed phosphoric acid compound; an inorganic acid; and water. There is also provided a process for cleaning a semiconductor substrate that includes a first step of cleaning the semiconductor substrate using the semiconductor substrate cleaning liquid composition and, subsequent to the first step, a second step of cleaning the semiconductor substrate with pure water, ozone water formed by dissolving ozone gas in pure water, or aqueous hydrogen peroxide.

REFERENCES:
patent: 3998707 (1976-12-01), Fong
patent: 4057503 (1977-11-01), Graver et al.
patent: 4328304 (1982-05-01), Tachikawa et al.
patent: 4377487 (1983-03-01), Freeman
patent: 4904309 (1990-02-01), Komabashiri et al.
patent: 5290361 (1994-03-01), Hayashida et al.
patent: 5560857 (1996-10-01), Sakon et al.
patent: 5885362 (1999-03-01), Morinaga et al.
patent: 5958399 (1999-09-01), Sonderfan et al.
patent: 6309698 (2001-10-01), Uesugi et al.
patent: 6323169 (2001-11-01), Abe et al.
patent: 6540935 (2003-04-01), Lee et al.
patent: 6637334 (2003-10-01), Akiyama et al.
patent: 6730644 (2004-05-01), Ishikawa et al.
patent: 6846336 (2005-01-01), Gerle et al.
patent: 7026096 (2006-04-01), Hotta
patent: 2001/0010891 (2001-08-01), Hotta et al.
patent: 2002/0055447 (2002-05-01), Ishikawa et al.
patent: 2003/0144163 (2003-07-01), Morinaga et al.
patent: 2003/0212181 (2003-11-01), Honda et al.
patent: 2003/0224281 (2003-12-01), Ishizuka et al.
patent: 2004/0053167 (2004-03-01), Hotta
patent: 2004/0167047 (2004-08-01), Ishikawa et al.
patent: 2004/0204329 (2004-10-01), Abe et al.
patent: 2004/0244300 (2004-12-01), Ichiki et al.
patent: 2005/0287480 (2005-12-01), Takashima
patent: 1061040 (1992-05-01), None
patent: 01-310356 (1989-12-01), None
patent: 5-275405 (1993-10-01), None
patent: 06-041770 (1994-02-01), None
patent: 06-132267 (1994-05-01), None
patent: 7-115077 (1995-05-01), None
patent: 09-151394 (1997-06-01), None
patent: 09/283480 (1997-10-01), None
patent: 2000-049132 (2000-02-01), None
patent: 2001-7071 (2001-01-01), None
patent: 2003-109930 (2003-04-01), None
patent: 2003-221600 (2003-08-01), None
patent: 2003-297792 (2003-10-01), None

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