Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-03-29
2011-03-29
Rosasco, Stephen (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07914949
ABSTRACT:
A method, a recording medium and an apparatus for testing a photomask are provided. In the disclosed method, a particular region of a photomask is selected, either from a physical instance of the photomask, or from the photomask as represented by a digital representation thereof. The particular region is then characterized by identifying a pattern type present in the particular region. A lithographic process stress condition is determined for the particular region, considering the pattern type, and thereafter, a result of lithographically patterning a feature is determined by simulating a photolithographic exposure, using the particular region of the photomask under the lithographic process stress condition. Then, it is decided whether the particular region of the photomask is acceptable based on the result of the simulated exposure only under the lithographic process stress condition.
REFERENCES:
patent: 4419438 (1983-12-01), Etoh et al.
patent: 6472108 (2002-10-01), Lin
patent: 6559662 (2003-05-01), Yamada et al.
patent: 2002/0146865 (2002-10-01), Hoel
patent: 2003/0226980 (2003-12-01), Kawashima
patent: 2003/0229880 (2003-12-01), White et al.
patent: 2004/0063000 (2004-04-01), Maurer et al.
patent: 2004/0086791 (2004-05-01), Aoki et al.
patent: 2004/0123266 (2004-06-01), Egorov et al.
patent: 2004/0170906 (2004-09-01), Chen et al.
patent: 2004/0267506 (2004-12-01), Bowley et al.
patent: 2005/0003280 (2005-01-01), Tsutsui et al.
patent: 2005/0031976 (2005-02-01), Kotani
Alam Rashid
International Business Machines - Corporation
Neff Daryl
Rosasco Stephen
Walsh Robert A.
LandOfFree
Method for testing a photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for testing a photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for testing a photomask will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2716259