Exposure mask and method of manufacturing a semiconductor...

Details Exposure mask and method of manufacturing a semiconductor... Exposure mask and method of manufacturing a semiconductor...

2011-04-19

2011-04-19

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S394000

Reexamination Certificate

active

07927764

ABSTRACT:
A method of manufacturing a film pattern includes forming a film over a substrate, applying a photoresist over the film, exposing the photoresist using a first mask pattern including a first mask opening and a second mask opening, and an optical proximity correction being applied only to the first mask opening, exposing the photoresist using a second mask pattern including a third mask opening and a fourth mask opening, an optical proximity correction being applied only to the fourth mask opening.

REFERENCES:
patent: 2002/0012858 (2002-01-01), Kawakubo et al.
patent: 2005/0136336 (2005-06-01), Schacht et al.
patent: 2006/0073425 (2006-04-01), Miyazaki et al.
patent: 2002-287324 (2002-10-01), None

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