Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2011-07-19

2011-07-19

Glick, Edward J (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S072000

Reexamination Certificate

active

07982852

ABSTRACT:
A scanning exposure apparatus exposing a substrate to a pattern of an original through a projection optical system while relatively moving the original and the substrate, includes a substrate stage movable while holding the substrate; a measurement system measuring a position of the substrate in an optical-axis direction of the projection optical system; and a controller relatively moving the original and the substrate while controlling a position of the substrate stage in the optical-axis direction, on the basis of the position of the substrate detected by the measurement system. The controller keeps accelerating the substrate stage up to a starting position of the irradiation of the exposure light for a target shot area on the substrate, and during the acceleration, controls the position of the substrate stage in the optical-axis direction, on the basis of a position of a surface of an exposed shot area, which has been exposed previously.

REFERENCES:
patent: 5448332 (1995-09-01), Sakakibara
patent: 5693439 (1997-12-01), Tanaka
patent: 6433872 (2002-08-01), Tanaka
patent: 6476904 (2002-11-01), Kubo
patent: 6608681 (2003-08-01), Sakakibara
patent: 2007/0206169 (2007-09-01), Butler
patent: 6-260391 (1994-09-01), None

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