Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2011-07-19

2011-07-19

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000

Reexamination Certificate

active

07982856

ABSTRACT:
A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into a number of first-order diffracted beams, one associated with a first pitch in the pattern, along a first direction, another associated with a second pitch along a different, second direction in the pattern. An area is identified where the first-order diffracted beam associated with the first pitch traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of this first-order diffracted beam in relation to the optical phase of the other first-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.

REFERENCES:
patent: 6310679 (2001-10-01), Shiraishi
patent: 6455438 (2002-09-01), Yanagisawa et al.
patent: 6541167 (2003-04-01), Petersen et al.
patent: 6549266 (2003-04-01), Taniguchi
patent: 7525640 (2009-04-01), Jansen et al.
patent: 2009/0296060 (2009-12-01), Finders
patent: 2007-317847 (2007-12-01), None
patent: 2009-0126216 (2009-12-01), None
Korean Office Action dated Jan. 19, 2011 in corresponding Korean Patent Application No. 10-2009-0055987.

Affiliated with

Also associated with

Rating

Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2714278