Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making
Reexamination Certificate
2011-06-28
2011-06-28
Huff, Mark F (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
C428S034100
Reexamination Certificate
active
07968252
ABSTRACT:
The present invention is directed to reduce pellicle frame distortions due to the tension of a pellicle film and caused during handling, thereby providing an excellent pellicle frame capable of reducing the distortion of a photomask due to a pellicle affixation. In the pellicle frame of the present invention, the frame consists of a plurality of layers of which at least one layer has a different elastic modulus. It is preferable to: make the pellicle frame compositely of a layer having an elastic modulus of 10 GPa or smaller and of a layer having an elastic modulus of 50 GPa or greater; join these layers of the pellicle frame in a direction perpendicular to the pellicle film face; laminate such that layers having a large elastic modulus form the outermost layer; or reverse this lamination structure.
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patent: 2006/0246234 (2006-11-01), Meyers et al.
patent: 2009/0246644 (2009-10-01), Chakravorty et al.
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JPO Machine Translation of Kasuse JP-2006-199477 (previously cited without translation by Applicant on IDS).
Fujita M. Et al. “Pellicle-induced distortions in advanced photomasks” Proceedings of the SPIE, SPIE, vol. 4754, Jul. 1, 2002, pp. 589-596 XP002464927, whole document.
Chinese Official Action dated Dec. 9, 2010, in corresponding Chinese Application No. 200810212835.8, and English translation in part.
Huff Mark F
Lowe Hauptman & Ham & Berner, LLP
Ruggles John
Shin-Etsu Chemical Co. , Ltd.
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