Self-aligned, sub-wavelength optical lithography

Details Self-aligned, sub-wavelength optical lithography Self-aligned, sub-wavelength optical lithography

2011-06-21

2011-06-21

Duda, Kathleen (Department: 1722)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C430S311000

Reexamination Certificate

active

07965381

ABSTRACT:
Embodiments of the invention provide a method and an apparatus for performing self-aligned, sub-wavelength optical lithography. One embodiment provides a region of photoresist above a conductive surface having a plurality of periodically arrayed openings extending therethrough. At least a portion of the region of photoresist is then exposed to a light, wherein the intensity of the light is less than the intensity required to cure the photoresist. In so doing, at least one self-aligned, sub-wavelength location in at least one location of the region of photoresist is cured.

REFERENCES:
patent: 6285020 (2001-09-01), Kim et al.
patent: 2004/0115568 (2004-06-01), Schmidt
patent: 2005/0117845 (2005-06-01), Hirose
patent: 2005/0175937 (2005-08-01), Bae
M. Rahman, et al. “Theory of a Metal-Semiconductor Photodiode With Granting Coupling of the Incident Light to Surface Plasma Waves” J. Appl. Phys. 66 (1), Jul. 1, 1989.

Affiliated with

Also associated with

Rating

Self-aligned, sub-wavelength optical lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Self-aligned, sub-wavelength optical lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-aligned, sub-wavelength optical lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2708909