Semiconductor light emitting device, its manufacturing...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal

Reexamination Certificate

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C438S031000, C438S037000, C257SE33023, C257SE21085

Reexamination Certificate

active

07964419

ABSTRACT:
A semiconductor light emitting device made of nitride III-V compound semiconductors is includes an active layer made of a first nitride III-V compound semiconductor containing In and Ga, such as InGaN; an intermediate layer made of a second nitride III-V compound semiconductor containing In and Ga and different from the first nitride III-V compound semiconductor, such as InGaN; and a cap layer made of a third nitride III-V compound semiconductor containing Al and Ga, such as p-type AlGaN, which are deposited in sequential contact.

REFERENCES:
patent: 5670798 (1997-09-01), Schetzina
patent: 6031858 (2000-02-01), Hatakoshi et al.
patent: 6060335 (2000-05-01), Rennie
patent: 6309459 (2001-10-01), Yuge
patent: 6365923 (2002-04-01), Kamei
patent: 6515313 (2003-02-01), Ibbetson
patent: 6590234 (2003-07-01), Kim et al.
patent: 7015153 (2006-03-01), Triyoso et al.
patent: 7098064 (2006-08-01), Hirukawa
patent: 2001/0004112 (2001-06-01), Furukawa et al.
patent: 0 803 916 (1999-10-01), None
patent: 63-046788 (1988-02-01), None
patent: 06-104525 (1994-04-01), None
patent: 09-266326 (1997-10-01), None
patent: 11-54794 (1999-02-01), None
patent: 11-243251 (1999-09-01), None
patent: 2000-101139 (2000-04-01), None
patent: 2000-151023 (2000-05-01), None
patent: 2000-349398 (2000-12-01), None
patent: 2001-094216 (2001-04-01), None
patent: 2001-102623 (2001-04-01), None
patent: 2001-196697 (2001-07-01), None
patent: 2001-203384 (2001-07-01), None
Shuji Nakamura, et al., “Characteristics of InGaN multi-quantum-well-structure lader diodes,” Applied Physics Letters, 1996, vol. 68, No. 23, pp. 3269-3271.
“InGaN Multi-Quantum-Well-Structure Laser Diodes with Cleaved Mirror Cavity Facets,” Jpn. J. Appl. Phys., vol. 35, 1996, pp. L217-L220.
“Blue InGaN-Based Laser Diodes with an Emission Wavelength of 450nm” Appl. Phys. Lett., vol. 76, 2000, pp. 22-24.
“Fist III-V-Nitride-Based Violet Laser Diodes” J. Crystal Growth, vol. 170, 1997, pp. 11-15.
“High-Power, Long-Lifetime InGaN/GaN/AlGaN-Based Laser Diodes Grown on Pure GaN Substrates.” Jpn. J. Appl. Phys., vol. 35, 1998, pp. L309-L312.
“InGaN/GaN/AlGaN-Based Laser Diodes Grown on Epitaxially Laterally Overgrown GaN,” J. Mater. Res., vol. 14, No. 7, 1999, pp. 2716-2731.
“InGaN/GaN/AlGaN-Based Laser Diodes with Modulation-Doped Strained-Layer Superlattices,” Jpn. J. Appl. Phys., vol. 36, 1997, pp. 1568-1571.
Japanese Office Action issued on May 11, 2010 in connection with counterpart JP Application No. 2006-303673.
Japanese Office Action issued on Sep. 21, 2010 in connection with JP counterpart appl. No. 2006-303673.

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