Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2011-05-03

2011-05-03

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S068000, C355S071000, C355S077000

Reexamination Certificate

active

07936446

ABSTRACT:
An exposure apparatus which illuminates a reticle with illumination light from a light source and projects light from the reticle onto a substrate to expose the substrate to light is disclosed. The apparatus comprises a shutter located on a path of the illumination light, a detector configured to detect a dose to the substrate, and a controller configured to control operation of the shutter. In a first exposure mode which uses illumination light with a first light intensity, the controller controls an open time of the shutter based on an output from the detector, and to store the open time. In a second exposure mode which uses illumination light with a second light intensity higher than the first light intensity, the controller controls a speed of the shutter based on the stored open time.

REFERENCES:
patent: 2008/0143990 (2008-06-01), Hirano
patent: 2010/0026975 (2010-02-01), Kikuchi
patent: 61-034252 (1986-08-01), None
patent: 05055106 (1993-03-01), None

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