Photosensitive diazonium material with precoat of graft polymer

Details Photosensitive diazonium material with precoat of graft polymer Photosensitive diazonium material with precoat of graft polymer

1984-05-01

1985-11-26

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430157, 430163, 430169, 430176, 430531, 430533, 430534, 430535, G03C 180, G03C 176

Patent

active

045554684

ABSTRACT:
A photosensitive material of the diazonium type which comprises a support, a precoat layer thereon and a photosensitive layer of a diazonium compound is improved by using a graft copolymer on a cellulose derivative as the precoat layer. A hydrophilic epoxy compound may be used in the precoat layer and a coupler and a benzenediazonium hexafluorophosphate derivative may be used in the photosensitive layer.

REFERENCES:
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patent: 3362825 (1968-01-01), Moskowitz et al.
patent: 3660097 (1972-05-01), Mainthia
patent: 3708296 (1973-01-01), Schlesinger
patent: 4131468 (1978-12-01), Rennison et al.
patent: 4154614 (1979-05-01), Tsunoda et al.
patent: 4275137 (1981-06-01), Verhoof
patent: 4457997 (1984-07-01), Thoese et al.

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