Method of manufacturing magnetic recording medium

Details Method of manufacturing magnetic recording medium Method of manufacturing magnetic recording medium

2011-07-05

2011-07-05

Tran, Binh X (Department: 1713)

Etching a substrate: processes

Forming or treating article containing magnetically...

C216S044000, C216S066000, C216S077000, C216S081000

Reexamination Certificate

active

07972523

ABSTRACT:
According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a magnetic recording layer, an oxidation inhibiting layer, a hard mask layer includes carbon on a substrate, coating the hard mask layer with a resist, transferring patterns of protrusions and recesses to the resist by imprinting to form resist patterns, sequentially performing etching of the hard mask layer using the resist patterns as masks, etching of the oxidation inhibiting layer, and etching and/or magnetism deactivation of the magnetic recording layer to form patterns of the magnetic recording layer, and sequentially performing stripping of the resist patterns, stripping of the hard mask layer and stripping of the oxidation inhibiting layer, in which ion beam etching is used for stripping the oxidation inhibiting layer.

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Notice of Reasons for Rejection mailed by JPO on Oct. 13, 2009 in the corresponding Japanese patent application No. 2008-192536.
Notice of Reasons for Rejection mailed by JPO on Feb. 2, 2010 in the corresponding Japanese patent application No. 2008-192536.
Explanation of Non-English Language References.

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