Etching a substrate: processes – Forming or treating electrical conductor article – Forming or treating of groove or through hole
Reexamination Certificate
2011-08-09
2011-08-09
Norton, Nadine G (Department: 1713)
Etching a substrate: processes
Forming or treating electrical conductor article
Forming or treating of groove or through hole
C216S072000, C216S058000, C438S689000, C438S706000, C438S737000
Reexamination Certificate
active
07993535
ABSTRACT:
A method for fabricating a device includes forming a first insulation layer to cover a removable mask and a device structure that has been defined by the mask. The device structure is below the mask. The mask is lifted off to expose a top portion of the device structure. A conductive island structure is formed over the first insulation layer and the exposed top portion of the device structure. The first insulation layer and the conductive island structure are covered with a second insulation layer. A contact is formed through the second insulation layer to the conductive island structure.
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Jiang Xin
Papworth Parkin Stuart Stephen
Sun Jonathan
Duclair Stephanie
F. Chau & Associates LLC
International Business Machines - Corporation
Kaufman, Esq. Stephen C.
Norton Nadine G
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