Semiconductor device manufacturing method

Details Semiconductor device manufacturing method Semiconductor device manufacturing method

2011-05-10

2011-05-10

Ghyka, Alexander G (Department: 2812)

Semiconductor device manufacturing: process

Having magnetic or ferroelectric component

C438S154000, C438S396000, C257SE21008, C257SE21272

Reexamination Certificate

active

07939347

ABSTRACT:
A semiconductor device manufacturing method includes forming a first film made of a first metal to an upper portion of a substrate, forming a second film made of an amorphous metal oxide or an microcrystalline metal oxide on the first film, subjecting the second film to a heat treatment, subjecting the second film after the heat treatment to a reduction treatment, forming a third film made of a ferroelectric material on the second film, and forming a fourth film made of a second metal on the third film.

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