Process of making an improved AP1 layer for a TMR device

Details Process of making an improved AP1 layer for a TMR device Process of making an improved AP1 layer for a TMR device

2011-05-31

2011-05-31

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603120, C029S603130, C029S603160, C029S603180, C216S022000, C216S038000, C216S067000, C427S255700, C360S324120

Reexamination Certificate

active

07950136

ABSTRACT:
A process to manufacturing a TMR read head with improved voltage breakdown is performed by laying down the AP1 layer as two or more layers. Each AP1 sub-layer is exposed to a low energy plasma for a short time before the next layer is deposited. This results in a smooth surface, onto which to deposit the tunneling barrier layer, with no disruption of the surface crystal structure of the completed AP1 layer.

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