Method for manufacturing semiconductor optical device

Details Method for manufacturing semiconductor optical device Method for manufacturing semiconductor optical device

Filed on

2011-07-19

Date issued

2011-07-19

Examiner

Nguyen, Kimberly D (Department: 2894)

Patent Class

Semiconductor device manufacturing: process

SubClass

Making device or circuit emissive of nonelectrical signal

Other Related Categories

C438S016000, C438S031000, C257S098000, C257SE21002, C257SE33067

Type

Reexamination Certificate

Status

active

Patent number

07981704

Description

ABSTRACT:
After a metal cap layer is laminated on a semiconductor laminated structure, a waveguide ridge is formed, the waveguide ridge is coated with an SiO2film, and a resist is applied; then, a resist pattern is formed, the resist pattern exposing the surface of the SiO2film on the top of the waveguide ridge, and burying the SiO2film in channels with a resist film having a surface higher than the surface of the metal cap layer of the waveguide ridge and lower than the surface of the SiO2film of the waveguide ridge; the SiO2film is removed by dry etching, using the resist pattern as a mask. The metal cap layer is removed by wet etching, and a p-GaN layer of the waveguide ridge is exposed to form the electrode layer.

REFERENCES:
patent: 5898222 (1999-04-01), Farooq et al.
patent: 6171876 (2001-01-01), Yuang et al.
patent: 6174747 (2001-01-01), Ho et al.
patent: 2002/0008966 (2002-01-01), Fjelstad et al.
patent: 2005/0226295 (2005-10-01), Taneya et al.
patent: 04-48670 (1992-02-01), None
patent: 7-307526 (1995-11-01), None
patent: 10-27935 (1998-01-01), None
patent: 10-117038 (1998-05-01), None
patent: 11-126947 (1999-05-01), None
patent: 2000-22261 (2000-01-01), None
patent: 2000-114664 (2000-04-01), None
patent: 2000-340880 (2000-12-01), None
patent: 2004-119772 (2000-12-01), None
patent: 2001-308461 (2001-11-01), None
patent: 2003-115632 (2003-04-01), None
patent: 2003-142769 (2003-05-01), None
patent: 2000-349395 (2004-04-01), None
patent: 2004-253545 (2004-09-01), None
patent: 03/085790 (2003-10-01), None

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