Illumination system and microlithographic projection...

Details Illumination system and microlithographic projection... Illumination system and microlithographic projection...

2011-08-16

2011-08-16

Glick, Edward (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

Reexamination Certificate

active

07999917

ABSTRACT:
The disclosure relates an illumination system configured to guide illumination light from a radiation source to an object plane and to provide defined illumination of an object field in the object plane, wherein illumination light is supplied to the object field by a bundle-guiding optical pupil component which is disposed in a pupil plane of the projection objective, and wherein at least another bundle-guiding component is disposed upstream of the pupil component in the beam path of the illumination light. The disclosure further concerns a projection exposure apparatus that includes such an illumination system of this type, a method of fabricating a microstructured component using such a projection exposure apparatus, and a microstructured component fabricated using such a method.

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Bal, Matthieu Frédéric, dissertation “Next-Generation Extreme Ultraviolet Lithographic Projection Systems”, pp. 1-139, (Feb. 10, 2003).
Office Action for corresponding Application No. JP 2008-529565, dated Dec. 7, 2009.
English translation of Office Action for corresponding Application No. JP 2008-529565, dated Feb. 21, 2011.

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