Method for manufacturing semiconductor device

Details Method for manufacturing semiconductor device Method for manufacturing semiconductor device

2011-04-12

2011-04-12

Vinh, Lan (Department: 1713)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S514000, C438S717000, C438S755000

Reexamination Certificate

active

07923375

ABSTRACT:
A method for manufacturing a semiconductor device includes forming a photo-resist pattern above a first film, implanting a predetermined dopant that increases an etching rate of the first film into the first film using the photo-resist pattern as a mask, thereby forming an implantation layer in the first film, and etching a first portion of the first film, which is at least a part of the implantation layer, using the photo-resist pattern as a mask.

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patent: 6774043 (2004-08-01), Yamaguchi et al.
patent: 2006/0051965 (2006-03-01), Edelberg et al.
patent: 2006/0115990 (2006-06-01), Seino et al.
patent: 2006-140222 (2006-06-01), None

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