Hydrogen separation membrane on a porous substrate

Gas separation: apparatus – Apparatus for selective diffusion of gases – Plural layers

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C096S007000, C095S055000, C095S056000, C429S411000, C502S004000, C264S044000, C264S666000, C264S674000, C264S676000, C264S681000

Reexamination Certificate

active

07959716

ABSTRACT:
A hydrogen permeable membrane is disclosed. The membrane is prepared by forming a mixture of metal oxide powder and ceramic oxide powder and a pore former into an article. The article is dried at elevated temperatures and then sintered in a reducing atmosphere to provide a dense hydrogen permeable portion near the surface of the sintered mixture. The dense hydrogen permeable portion has a higher initial concentration of metal than the remainder of the sintered mixture and is present in the range of from about 20 to about 80 percent by volume of the dense hydrogen permeable portion.

REFERENCES:
patent: 3413777 (1968-12-01), Langley et al.
patent: 5534471 (1996-07-01), Carolan et al.
patent: 6214757 (2001-04-01), Schwartz et al.
patent: 6569226 (2003-05-01), Dorris et al.
patent: 7393384 (2008-07-01), Gopalan et al.
patent: 7396384 (2008-07-01), Barker et al.
patent: 2003/0183080 (2003-10-01), Mundschau
patent: 2004/0129135 (2004-07-01), Roark et al.
patent: 2005/0222479 (2005-10-01), Balachandran
patent: 2008/0282882 (2008-11-01), Saukaitis et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Hydrogen separation membrane on a porous substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hydrogen separation membrane on a porous substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hydrogen separation membrane on a porous substrate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2673895

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.