Coating and developing apparatus, coating and developing...

Details Coating and developing apparatus, coating and developing... Coating and developing apparatus, coating and developing...

2011-05-03

2011-05-03

Mathews, Alan A (Department: 2882)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C355S027000, C414S940000, C118S066000

Reexamination Certificate

active

07934880

ABSTRACT:
Disclosed herein is a coating and developing apparatus1whose decreases in substrate-conveying accuracy can be suppressed. A processing block S2of the coating and developing apparatus1includes multiple resist-film forming blocks G2, G3, and a developing block G1. A conveyance element12for substrate loading into the processing block S2is provided to convey substrates W from a carrier C to the resist-film forming blocks G2, G3. Also, a conveyance element I for substrate loading into an exposure apparatus S4is provided in an interface block S3to load the substrates W into the exposure apparatus S4and after unloading the substrates W from the exposure apparatus S4, convey the substrates W to the developing block G1. The processing block loading conveyance element12conveys the substrates W, one at a time, from the carrier C to each resist-film forming block G2, G3, sequentially and periodically, and the exposure apparatus loading conveyance element I loads the substrates W from each resist-film forming block G2, G3into the exposure apparatus S4in the sequence that each has been conveyed to the resist-film forming block G2, G3by the processing block loading conveyance element12.

REFERENCES:
patent: 5700127 (1997-12-01), Harada et al.
patent: 6377329 (2002-04-01), Takekuma
patent: 7645081 (2010-01-01), Hara et al.
patent: 2006/0120716 (2006-06-01), Hamada
patent: 2006/0201423 (2006-09-01), Akimoto et al.
patent: 2006-253501 (2006-09-01), None

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