Positive resist composition, method of forming resist...

Details Positive resist composition, method of forming resist... Positive resist composition, method of forming resist...

2011-04-05

2011-04-05

Chandrakumar, Nizal S (Department: 1625)

Organic compounds -- part of the class 532-570 series

Organic compounds

Carboxylic acid esters

C560S188000

Reexamination Certificate

active

07919651

ABSTRACT:
A compound represented by general formula (I) shown below; and a polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below:wherein R1represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent; B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent; and R2represents an acid dissociable, dissolution inhibiting group.

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Office Action (Notice of Allowance) issued in counterpart Korean Patent Application No. 10-2008-0076279, dated Jul. 19, 2010.

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