Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2011-02-15
2011-02-15
Webb, Gregory E (Department: 1796)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000
Reexamination Certificate
active
07888301
ABSTRACT:
An aqueous-based composition and process for removing photoresist, bottom anti-reflective coating (BARC) material, and/or gap fill material from a substrate having such material(s) thereon. The aqueous-based composition includes a fluoride source, at least one organic amine, at least one organic solvent, water, and optionally chelating agent and/or surfactant. The composition achieves high-efficiency removal of such material(s) in the manufacture of integrated circuitry without adverse effect on metal species on the substrate, such as copper, and without damage to SiOC-based dielectric materials employed in the semiconductor architecture.
REFERENCES:
patent: 5792274 (1998-08-01), Tanabe et al.
patent: 6319835 (2001-11-01), Sahbari et al.
patent: 6372410 (2002-04-01), Ikemoto et al.
patent: 6773873 (2004-08-01), Seijo et al.
patent: 6831048 (2004-12-01), Kezuka et al.
patent: 6946396 (2005-09-01), Miyazawa et al.
patent: 2001/0050350 (2001-12-01), Wojtczak et al.
patent: 2002/0037820 (2002-03-01), Small et al.
patent: 2003/0078173 (2003-04-01), Wojtczak et al.
patent: 2003/0114014 (2003-06-01), Yokoi et al.
patent: 2003/0181342 (2003-09-01), Seijo et al.
patent: 2004/0029753 (2004-02-01), Ikemoto et al.
patent: 2005/0089489 (2005-04-01), Carter et al.
patent: 2005/0187118 (2005-08-01), Haraguchi et al.
patent: 1277830 (2003-01-01), None
patent: 03006599 (2003-01-01), None
patent: 03035797 (2003-05-01), None
patent: 03091376 (2003-11-01), None
patent: 2004094581 (2004-11-01), None
Bernhard David D.
Fujita Yoichiro
Miyazawa Tomoe
Nakajima Makoto
Advanced Technology & Materials Inc.
Fuierer Tristan A.
Moore & Van Allen PLLC
Webb Gregory E
LandOfFree
Resist, barc and gap fill material stripping chemical and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Resist, barc and gap fill material stripping chemical and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist, barc and gap fill material stripping chemical and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2649907